A METASURFACE ARRANGEMENT

摘要

The present disclosure relates to a metasurface arrangement (100, 200, 300) comprising a first metasurface (101, 201, 301) and a second metasurface (102, 202, 302) which run mutually parallel and face each other. Each metasurface (101, 102; 201, 202; 301, 302) comprises a corresponding periodic or quasi-periodic structure (103, 104; 203, 204; 303, 304) formed in a respective pattern. The first metasurface (101, 201, 301) is formed in a dielectric material structure (105, 205, 305) and the second metasurface is formed in either a dielectric material structure (106, 206) or in an electrically conducting structure (306). The periodic or quasi-periodic structure (103; 203; 303) on the first metasurface (101, 201, 301) is configured to yield a first response to an incident electromagnetic wave between the two metasurfaces (101, 102; 201, 202; 301, 302), and the periodic or quasi-periodic structure (104; 205; 306) on the second metasurface (102, 202, 302) is configured to yield a second response to the incident electromagnetic wave between the two metasurfaces (101, 102; 201, 202; 301, 302) that is equivalent to the first response, thereby rendering the two metasurfaces (101, 102; 201, 202; 301, 302) mutually electromagnetically symmetric.