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METHOD FOR CONFIRMING REFERENCE IMAGE METHOD FOR INSPECTING MASK AND APPARATUS FOR INSPECTING MASK

机译:确认参考图像的方法以及用于检查面具的设备

摘要

The reference circuit 24 generates a reference image based on a comparison of the design data of the mask 2 and the optical image of the mask 2 in the first predetermined region of the mask 2 having the pattern, and generates the generated reference image. The validity of the reference image is confirmed, and the validation of the validity of the reference image is a confirmation region where the additional circuit confirms the validity of the reference image, in addition to the first region previously set as the confirmation region, the mask 2 And adding a second area of the device, and confirming whether or not the reference image is valid in the confirmation area including the first area and the second area.
机译:参考电路24基于掩模2的设计数据与掩模2的具有图案的第一预定区域中的掩模2的光学图像的比较来生成参考图像,并且生成所生成的参考图像。确认参考图像的有效性,并且参考图像的有效性的确认是除了先前设置为确认区域的第一区域之外,附加电路还确认参考图像的有效性的确认区域。 2,添加设备的第二区域,并在包括第一区域和第二区域的确认区域中确认参考图像是否有效。

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