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PRODUCTION METHOD OF CHEMICAL-MECHANICAL POLISHING SLURRY COMPOSITION, COMPRISING ABRASIVE WHICH HAS NARROW PARTICLE SIZE DISTRIBUTION
PRODUCTION METHOD OF CHEMICAL-MECHANICAL POLISHING SLURRY COMPOSITION, COMPRISING ABRASIVE WHICH HAS NARROW PARTICLE SIZE DISTRIBUTION
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机译:化学-机械抛光淤浆组合物的生产方法,包括粗粒度分布较窄的磨料
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摘要
The present invention relates to a production method of a chemical-mechanical polishing slurry composition, comprising an abrasive which has narrow particle size distribution, and to a polishing slurry composition. The polishing slurry composition produced through the production method of the chemical-mechanical polishing slurry composition has constant average particle size due to narrow particle size distribution of a wet milled abrasive. The production method of a chemical-mechanical polishing slurry composition comprises the steps of: mixing an abrasive, a dispersant, and a pH adjusting agent; and wet-milling a mixture using a wet milling machine.;COPYRIGHT KIPO 2020
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