- Method for quantitative measurement of defects within block-copolymer thin-flim having lamellar pattern

摘要

The present invention relates to a method for quantitatively analyzing morphological defects in a block-copolymer thin film having a self-assembled lamellar pattern, which includes a series of processing using an SEM image. The method of the present invention comprises: a first step of preparing an original SEM image; a second step of converting the original image into a binary image; a third step of preparing a rectangular pixel block; a fourth step of sweeping the block; a fifth step of calculating a frequency; a sixth step of calculating information entropy; a seventh step of searching a linear region; an eighth step of exploring a saturating behavior; and a ninth step of calculating configuration entropy (S_C).