首页> 外国专利> PMMA METHOD FOR FABRICATING FIELD EFFECT TRANSISTOR AND METHD FOR REMOVING POLY METHYL METHACRYLATE FROM GRAPHENE DEVICE

PMMA METHOD FOR FABRICATING FIELD EFFECT TRANSISTOR AND METHD FOR REMOVING POLY METHYL METHACRYLATE FROM GRAPHENE DEVICE

机译:用于制造场效应晶体管的PMMA方法和从石墨烯装置中除去聚甲基丙烯酸甲酯的方法

摘要

A method of manufacturing a field effect transistor according to an embodiment of the present invention includes forming a source electrode and a drain electrode on a substrate; Forming a stacked structure by combining at least a part of PMMA on graphene; Stacking the structure to cover the source electrode and the drain electrode on a semiconductor substrate on which the source electrode and the drain electrode are formed; And removing PMMA from the structure by irradiating an electron beam onto the top surface of the structure and then developing it.
机译:根据本发明实施例的场效应晶体管的制造方法包括:在基板上形成源电极和漏电极;以及在基板上形成源电极和漏电极。通过在石墨烯上结合至少一部分PMMA形成堆叠结构;在其上形成有源电极和漏电极的半导体衬底上堆叠结构以覆盖源电极和漏电极;然后通过向结构的顶面照射电子束然后对其进行显影来从结构中除去PMMA。

著录项

  • 公开/公告号KR20200071971A

    专利类型

  • 公开/公告日2020-06-22

    原文格式PDF

  • 申请/专利权人 아주대학교산학협력단;

    申请/专利号KR20180159624

  • 发明设计人 안영환;손병희;

    申请日2018-12-12

  • 分类号H01L29/417;H01L21/02;H01L21/027;H01L21/306;H01L21/8234;H01L29/16;

  • 国家 KR

  • 入库时间 2022-08-21 11:06:41

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