Manufacturing method of gold sputtering target and manufacturing method of gold film

摘要

A method of manufacturing a gold sputtering target that makes it possible to increase the uniformity of the film thickness distribution of an Au film. The method for producing a gold sputtering target of the present invention is made of gold and unavoidable impurities, and the average value of Vickers hardness is 40 or more and 60 or less, the average crystal grain size is 15 μm or more and 200 μm or less, and gold (110) on the sputtered surface } There is provided a process for producing a gold sputtering target whose surface is oriented first.