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Compositions for depositing silicon-containing thin films containing bisaminosilylalkylamine compound and methods for manufacturing silicon-containing thin film using the same
Compositions for depositing silicon-containing thin films containing bisaminosilylalkylamine compound and methods for manufacturing silicon-containing thin film using the same
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机译：用于沉积包含双氨基甲硅烷基烷基胺化合物的含硅薄膜的组合物以及使用该组合物制造含硅薄膜的方法
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摘要
The present invention relates to a silicon-containing thin film deposition composition comprising a bis(aminosilyl)alkylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more specifically, bis(amino) that can be usefully used as a precursor for a silicon-containing thin film. It relates to a composition for depositing a thin film containing silicon containing a silyl) alkylamine compound and a method for manufacturing a thin film containing silicon using the same.
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