Compound, latent base generator, photosensitive resin composition containing the compound, and cured product

摘要

An object of the present invention is a novel compound that exhibits sufficient absorption in long wavelength ultraviolet (especially 365 nm) and has satisfactory sensitivity (base generation ability), a latent base generator containing the compound, and a polymerization initiator of the compound It is to provide the photosensitive resin composition and the hardened|cured material which are contained as. The present invention provides a compound represented by the following general formula (I). Furthermore, the present invention provides a latent base generator containing the compound, a polymerization initiator containing the compound, a photosensitive resin composition containing the polymerization initiator (A) and a photosensitive resin (B), and a cured product thereof and preparation thereof Provides a way. (Refer to the specification for the definition of the symbol in the formula.)