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Cu Experimental and numerical method for Cu metal coatings at room temperature via powder spray process

机译:铜粉末喷涂常温铜金属涂层的实验与数值方法

摘要

An experimental numerical analysis method for a room temperature Cu metal coating through a powder spray process is disclosed. The effect of Cu particles on the deposition behavior of the Cu coating layer is investigated by experimental and numerical studies to reveal the coating behavior of metal films during the aerosol deposition (AD) process. Experimental results show that the Cu film processed using 2㎛ Cu powder has a dense microstructure with high deposition rate (1.52 ±0.6㎛/min) and low electrical resistivity (9.5 ±0.4μΩcm), and high internal microdeformation ( micro-strain). Moreover, Cu films processed using 2 μm Cu powder had a dense microstructure and a Cu oxide phase due to the elevated temperature caused by the kinetic energy of the impacted particles. However, Cu films prepared using 5 μm Cu powder formed a thin deposition layer of 0.5 μm or less having a poor structure and electrical properties. Numerical results show that the strain and heat generated at the collision interface between the particle and the substrate decrease significantly as the particle size increases. In contrast, the maximum impact pressure of the metallic Cu particles increased with increasing the Cu particle size. These results are suitable for metal Cu particles having a size of about 2 μm to form a high-quality coating layer, and their bonding is related to high compressive strain and thermal energy.
机译:公开了一种通过粉末喷涂工艺对室温铜金属涂层进行实验数值分析的方法。通过实验和数值研究研究了Cu颗粒对Cu涂层的沉积行为的影响,以揭示在气溶胶沉积(AD)过程中金属膜的涂覆行为。实验结果表明,使用2㎛Cu粉末处理的Cu膜具有致密的微观结构,具有高的沉积速率(1.52±0.6㎛/ min)和低的电阻率(9.5±0.4μΩcm),以及较高的内部微形变(微应变)。而且,由于由撞击粒子的动能引起的温度升高,使用2μmCu粉处理的Cu膜具有致密的微观结构和Cu氧化物相。然而,使用5μm的Cu粉制备的Cu膜形成0.5μm或更小的薄沉积层,其具有差的结构和电性能。数值结果表明,随着粒径的增加,在颗粒与基底之间的碰撞界面处产生的应变和热量显着降低。相反,金属Cu颗粒的最大冲击压力随着Cu颗粒尺寸的增加而增加。这些结果适合于具有约2μm的尺寸的金属Cu颗粒以形成高质量的涂层,并且它们的结合与高压缩应变和热能有关。

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