Apparatus for treating waste gas in producing semiconductor and method for treating waste gas

摘要

The present invention relates to a processing apparatus and a processing method for processing waste gas generated during semiconductor production. The waste gas includes N ₂ O gas, and the treatment apparatus according to the present invention includes a filter unit for removing foreign substances from the waste gas flowing from the outside; An adsorption column part including a first adsorbent for selectively adsorbing and desorbing N ₂ O gas among the waste gas passing through the filter part; A catalytic reactor located at a rear end of the adsorption column portion and decomposing N ₂ O gas desorbed from the adsorption column portion; A hydrogen supply unit supplying hydrogen to the catalytic reactor; And a cooler located at a rear end of the catalytic reactor.