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3 3 METHOD OF MANUFACTURING THREE-DIMENSIONAL ELECTRODE SYSTEM AND THREE-DIMENSIONAL ELECTRODE DEVICE MANUFACTURED BY THE METHOD
3 3 METHOD OF MANUFACTURING THREE-DIMENSIONAL ELECTRODE SYSTEM AND THREE-DIMENSIONAL ELECTRODE DEVICE MANUFACTURED BY THE METHOD
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机译:3 3制造三维电极系统的方法和由该方法制造的三维电极装置
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摘要
The present invention relates to a method of manufacturing a 3D electrode device and a 3D electrode device manufactured by the method of manufacturing the same, and more specifically, a 3D electrode capable of applying electrical stimulation to the retina by adhering to the retina without damaging the retina. It relates to a manufacturing method of a device and a three-dimensional electrode device manufactured by the manufacturing method thereof. The present invention comprises the steps of: a) depositing a silicon layer on one side of the wafer, and patterning the silicon layer into a predetermined shape; b) depositing a metal layer on the other surface of the wafer where the silicon layer is patterned on one surface, and patterning the metal layer into a predetermined shape; c) forming a processing hole on the other surface of the wafer in which the metal layer is patterned; d) forming a substrate portion in the formed processing hole; e) forming an electrode portion by etching one surface of the wafer on which the substrate portion is formed; And f) forming a deposition layer on the formed upper portion of the electrode portion, wherein the substrate portion is provided to be deformed corresponding to the shape of the retina and the photoreceptor layer, wherein the electrode portion is in close contact with the retina. A method of manufacturing a dimensional electrode device is provided.
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