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ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT
ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT
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机译:通过聚合物管理来提高蚀刻系统的生产率
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摘要
The embodiments described herein generally relate to apparatus and methods for reducing the deposition of polymers within a semiconductor processing chamber. A heater jacket and heat sources are provided and can be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of a processing chamber is also provided.
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