Lithographic substrate marking equipment, lithographic wafer marking equipment and processes for producing substrate coding marks

摘要

Lithographic substrate marking device with:a first lithographic exposure device (104; 301),which is located in a housing (344; 434) and is configured to produce a first electromagnetic radiation type during a variety of exposures; a mobile reticle (112; 306) with a variety of different retinal fields (308),which are configured to block a part of the first electromagnetic radiation type to illuminate a substrate coding mark (204) in a light sensitive material over a semiconductor substrate;a transverse motion element (114),which is configured to move the mobile reticule (112; 306) in such a way that some of the variety of different reticule fields (308) are exposed to the photosensitive material during some of the variety of exposures; and a radiation guide (318),configured to provide the first electromagnetic radiation type for a position illuminating one of the multitude of different reticular fields (308) without illuminating another of the multitude of different reticular fields (308); the radiation guidance (318) includes a hollow cylinder, which extends between the first electromagnetic source (302) and the first moving substrate (314), and which is rotatable and inserted into the hollow cylinder.