The invention relates to a method for operating a control system for controlling the position of an element, in particular in a microlithographic projection exposure system, the control system having a controller (30) for controlling a force (F) exerted on the element, and the controller (30) has a control unit (31) for generating a control signal and a notch filter (32) for aftertreatment of this control signal. A method according to the invention has the following steps: determining a frequency response of the element for a predetermined interference signal; Identifying at least one peak within a frequency spectrum corresponding to this frequency response, for which an unauthorized amplification of interference or an unstable behavior of the control system is to be expected; Determine for this at least one peak, in each case a value for the peak frequency (ω), for the peak height (h) and for the peak width (Δf); and automatic parameterization of the notch filter (32) by setting a value for the damping parameters (d, d) of the notch filter (32) based on the determined values.
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