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A gas processing system for processing odor-laden gases via matrix plasma discharge

机译:气体处理系统,用于通过基质等离子体放电处理充满异味的气体

摘要

A gas processing system for processing odor-laden gases via matrix plasma discharge, consisting of the processing cylinder (1) and the filter cylinder (2), which is characterized in that the processing cylinder (1) is mounted on the filter cylinder (2) at the top, between the The top of the filter cylinder (2) and one side of the processing cylinder (1) the connection tube (3) is welded, inside the filter cylinder (2) multi-stage filter plates (4) are mounted by screwing and inside the processing cylinder (1) from bottom to top the first processing chamber (5), the second processing chamber (6) and the third processing chamber (7) are each arranged, while between the second processing chamber (6) and the first processing chamber (5) and the third processing chamber (7) respectively connecting channels ( 8) are formed and in the first processing chamber (5), the second processing chamber (6) and the d Ride treatment chamber (7) discharge assemblies are set, the inlet tube (9) is welded to one side of the filter cylinder (2), which has a sealing structure inside.
机译:一种由处理筒(1)和过滤筒(2)组成的用于通过基质等离子体放电处理气味气体的气体处理系统,其特征在于,处理筒(1)安装在过滤筒(2)上。 )在过滤筒(2)的顶部和处理筒(1)的一侧之间的顶部,连接管(3)在过滤筒(2)内焊接多级过滤板(4)第一处理室(5)通过螺纹安装并从下到上地安装在处理筒(1)内,第二处理室(6)和第三处理室(7)分别布置在第二处理室(5)之间。在第一处理室(5),第二处理室(6)和dRide处理室(6)中分别形成有分别连接通道(8)的第一处理室(5)和第三处理室(7)。 7)设置好排放组件,将进口管(9)焊接好过滤器缸(2)的一侧具有内部密封结构。

著录项

  • 公开/公告号DE212020000068U1

    专利类型

  • 公开/公告日2020-06-24

    原文格式PDF

  • 申请/专利号DE20202100068U

  • 发明设计人

    申请日2020-05-26

  • 分类号B01J19/08;

  • 国家 DE

  • 入库时间 2022-08-21 11:00:47

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