The present description relates to a method of manufacturing an optical system (5) comprising a layer (24) comprising through or partially through holes (26) and covered with a matrix of optical elements of micrometric size (14). The optical system comprises a face (22) intended to receive a first radiation. The method comprises exposing a film (24), of the same material as the layer or of a material different from that of the layer, to a second radiation through the matrix of optical elements of micrometric size (14 ), said material being photosensitive to the second radiation or machinable by the second radiation and the removal of the parts of the film exposed or not exposed to the second radiation to delimit the holes (26) passing completely or partially through said layer.
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