The present invention relates to a thermochemical treatment installation (100) comprising a loading zone (140) comprising one or more supports (120, 122) suitable for receiving substrates to be treated (130), said loading zone comprising a first heating means (110) comprising a cylindrical side wall (101) delimiting the loading area, a first opening (104) allowing the injection of a gas phase into the loading area, a second opening (105) allowing the exit of the gas phase out of the loading zone, characterized in that the loading zone further comprises a second heating means (160) arranged in the center of said loading zone. Figure for the abstract: Figure 1
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