首页> 外国专利> BARRIÈRE ARRIÈRE À BASE D'ALLIAGE NUMÉRIQUE DESTINÉE À DES TRANSISTORS AU NITRURE À CANAL P

BARRIÈRE ARRIÈRE À BASE D'ALLIAGE NUMÉRIQUE DESTINÉE À DES TRANSISTORS AU NITRURE À CANAL P

摘要

A III-nitride power handling device and the process of making the III-nitride power handling device are disclosed that use digital alloys as back barrier layer to mitigate the strain due to lattice mismatch between the channel layer and the back barrier layer and to provide increased channel conductivity. An embodiment discloses a GaN transistor using a superlattice binary digital alloy as back barrier comprising alternative layers of AlN and GaN. Other embodiments include using superlattice structures with layers of GaN and AlGaN as well as structures using AlGaN/AlGaN stackups that have different Aluminum concentrations. The disclosed device has substantially increased channel conductivity compared to traditional analog alloy back barrier devices.

著录项

  • 公开/公告号EP3673513A1

    专利类型

  • 公开/公告日2020.07.01

    原文格式PDF

  • 申请/专利权人 HRL Laboratories, LLC;

    申请/专利号EP17922088

  • 发明设计人 CHU, Rongming;CAO, Yu;

    申请日2017.08.25

  • 分类号

  • 国家 EP

  • 入库时间 2022-08-21 10:54:27

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