NOUVEAU COPOLYMÈRE SÉQUENCÉ RÉSINE ORGANOPOLYSILOXANE LINÉAIRE, ET APPLICATION AINSI QUE PROCÉDÉ DE FABRICATION DE CELUI-CI

摘要

Provided is a novel resin-linear organopolysiloxane block copolymer which has a high degree of freedom in formulation due to excellent compatibility with other lipophilic starting materials, in addition to exhibiting excellent film forming properties and followability of a film, while the stickiness of a film or the like is suppressed. This resin-linear organopolysiloxane block copolymer has: a resin structure (A1) block that has siloxane units represented by RSiO(wherein Rrepresents a monovalent organic group, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms) and SiO; and a linear structure (A2) block represented by (RSiO)n (wherein n represents a number of 5 or more while R represents an alkyl group, a fluoroalkyl group, or an aryl group) in each molecule, wherein the resin structure (A1) and the linear structure (A2) are linked to each other by an Si-O-Si bond, and an Si atom bonded to the resin structure (A1) constitutes an RSiOunit.