Procédé de fabrication de particules de dioxyde de silicium modifiées en surface pouvant être redispersées

摘要

Producing surface-modified silicon dioxide particles with an average particle diameter of 100 nm comprises providing a predispersion, high pressure grinding the predispersion under the formation of a dispersion and separating liquid phase of the dispersion, where the predispersion contains: surface modified silicon dioxide particles that are at least partially aggregated and exhibit reactive groups on their surface; one or more organosilicon compounds that exhibit at least a silicon-carbon bond and at least one functional group; and one or more solvents. Producing surface-modified silicon dioxide particles with an average particle diameter of 100 nm comprises providing a predispersion, high pressure grinding the predispersion under the formation of a dispersion and separating liquid phase of the dispersion, where the predispersion contains: surface modified silicon dioxide particles that are at least partially aggregated, connected with the surface modified components via silicon-oxygen-silicon bonds and exhibit reactive groups on their surface; one or more organosilicon compounds that exhibit at least a silicon-carbon bond and at least one functional group that is reacted with reactive groups with the formation of covalent silicon-oxygen-silicon bond; and one or more solvents. An independent claim is included for the surface-modified silicon dioxide particles, obtained by the above process.