POLYMÈRE DE SILOXANE CONTENANT DE L'ACIDE ISOCYANURIQUE ET DES SQUELETTES DE POLYÉTHER, COMPOSITION DE RÉSINE PHOTOSENSIBLE, PROCÉDÉ DE FORMATION DE MOTIFS ET FABRICATION DE DISPOSITIF OPTO-SEMICONDUCTEUR

摘要

A siloxane polymer comprising polysiloxane, silphenylene, isocyanuric acid, and polyether skeletons in a backbone and having an epoxy group in a side chain is provided. A photosensitive resin composition comprising the siloxane polymer and a photoacid generator is coated to form a film which can be patterned using radiation of widely varying wavelength. The patterned film has high transparency and light resistance.