首页> 外文OA文献 >Implant success remains high despite grafting voids in the maxillary sinus
【2h】

Implant success remains high despite grafting voids in the maxillary sinus

机译:尽管在上颌窦内移植了空洞,但植入成功仍然很高

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

ObjectivesGiven that the nature and presence of voids present within grafted sinuses following maxillary sinus elevation procedures were not known, nor was the contribution of these factors to implant success, the purpose of this study was to investigate these parameters and their relationship to implant success.Materials and MethodsThis study evaluated data from 25 subjects who had a lateral window maxillary sinus augmentation procedure. Cone‐beam computed tomography (CBCT) was performed at baseline and 4 months after surgery. CBCT images were used to evaluate grafted sites prior to implant placement. Using CBCT images, three examiners independently measured bone‐grafted areas (BG), void areas (V), and percentage of void areas (V%) from six different sections within grafted sites. The six sections were defined as a cross‐sectional (CS) midpoint, CS mesial point, CS distal point, horizontal section (HS) low point, HS midpoint, and HS high point. Implant success was also determined.ResultsThe calculated V% (V/BG) for the CS midpoint, CS mesial point, CS distal point, HS low point, HS midpoint, and HS high point were 5.30 ± 6.67%, 5.79 ± 8.51%, 6.67 ± 7.12%, 2.07 ± 2.56%, 5.30 ± 6.62%, and 4.92 ± 5.17% respectively. Implant success after 6 months of follow‐up approximated 100%.ConclusionsAlthough voids within grafts varied in terms of distribution and size, the V% within the HS low point were significantly smaller compared to those within the CS midpoint and CS distal point, which had the most intra‐subject V%. Thus, more attention should be given to the distal aspect of the sinus when compacting graft materials in the lateral wall sinus augmentation procedure. Implant success was not influenced by the existence of voids as implant success remained high.
机译:鉴于上颌窦抬高手术后移植窦内空隙的性质和存在是未知的,也不知道这些因素对植入成功的贡献,因此本研究的目的是研究这些参数及其与植入成功的关系。方法和方法本研究评估了来自25位上颌窦外侧窗增大术的受试者的数据。基线和术后4个月进行了锥形束计算机断层扫描(CBCT)。 CBCT图像用于评估植入物植入前的移植部位。使用CBCT图像,三名检查员独立测量了移植部位内六个不同部位的骨移植区域(BG),空隙区域(V)和空隙区域百分比(V%)。六个部分定义为横截面(CS)中点,CS中间点,CS远端点,水平部分(HS)最低点,HS中点和HS最高点。结果还确定了CS中点,CS中间点,CS远端点,CS远端点,HS低点,HS中点和HS高点的计算的V%(V / BG)为5.30±6.67%,5.79±8.51%,分别为6.67±7.12%,2.07±2.56%,5.30±6.62%和4.92±5.17%。随访6个月后的植入成功率约为100%。结论尽管移植物中的空隙在分布和大小方面有所不同,但HS低点的V%明显小于CS中点和CS远端的V%。主体内V%最高。因此,在侧壁鼻窦增大手术中压紧移植材料时,应更加注意鼻窦的远端。由于植入物的成功率很高,因此植入物的成功不受空隙的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号