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Laser-doped selective emitter and local back surface field solar cells with rear passivation

机译:激光掺杂的选择性发射极和具有背面钝化作用的局部背面场太阳能电池

摘要

This thesis examines two different ways to improve the performance of single sided laser-doped solar cells. The first is replacing the aluminum rear contact with localised contacts and a high-quality passivation layer. The second is optimising the laser processing to minimise any detrimental effects. It is demonstrated that annealing in the 600-820°C range significantly improves the passivation of different SiNx films on different silicon surfaces. Significant bulk lifetime enhancement is seen when SiNx-passivated CZ wafers are annealed. Using an optimal annealing condition, the implied Voc of CZ silicon substrates increased to a value comparable to that of FZ wafers - almost 720 mV.Laser-induced defects are investigated using a wide range of characterisation techniques. It is found that laser doping degrades the electrical performance of the device. This degradation is more pronounced when a dielectric layer is present during the laser process, possibly due to the thermal expansion mismatch between the silicon and the overlying dielectric layer. Methods to reduce defect density are discussed.The influence of laser parameters on the electrical performance of laser-doped solar cells is studied. It is demonstrated that a wide range of laser diode currents can be used to create a p-n junction by laser doping. Grooves formed through intermediate levels of ablation can be used to improve the adhesion between the silicon and metal without significantly degrading the cell performance. Electroless and photo-plating are compared; higher pseudo-FFs are achieved for photoplated laser-doped solar cells. If the photoplating technique is combined with well-optimised Ni sintering, the pseudo-FF is almost independent of the laser diode current.A new double sided laser-doped structure is developed. This structure is based on silicon nitride passivation of the rear surface and the formation of a selective emitter and local back-surface field by laser doping. One-sun implied Voc above 680 mV is achieved on commercial grade CZ p-type wafers when measured after laser doping and prior to metallisation. This is ~50 mV higher than the Voc obtained for the single-sided laser-doped cell at the same stage. This high Voc demonstrates the potential of this structure to achieve efficiencies exceeding 20%.
机译:本文研究了两种提高单面激光掺杂太阳能电池性能的方法。首先是用局部触点和高质量钝化层代替铝制后触点。第二是优化激光加工,以最大程度地减少有害影响。结果表明,在600-820°C范围内进行退火可显着改善不同硅表面上不同SiNx膜的钝化。当对SiNx钝化的CZ晶片进行退火时,可以看到堆寿命的显着提高。在最佳退火条件下,CZ硅基板的隐含Voc值增加到与FZ晶片相当的值-接近720 mV。使用广泛的表征技术研究了激光诱发的缺陷。发现激光掺杂降低了器件的电性能。当在激光处理过程中存在介电层时,这种退化更为明显,这可能是由于硅与上覆介电层之间的热膨胀不匹配所致。讨论了降低缺陷密度的方法。研究了激光参数对掺激光太阳能电池电性能的影响。已经证明,可以通过激光掺杂使用多种激光二极管电流来创建p-n结。通过中等程度的烧蚀形成的凹槽可用于改善硅与金属之间的附着力,而不会显着降低电池性能。比较化学镀和电镀;对于电镀激光掺杂的太阳能电池,可以获得更高的伪FF。如果将电镀技术与优化的Ni烧结相结合,则伪FF几乎与激光二极管电流无关。开发了一种新型的双面激光掺杂结构。该结构基于背面的氮化硅钝化以及通过激光掺杂形成的选择性发射极和局部背面电场。在激光掺杂之后和金属化之前进行测量时,在商业级CZ p型晶片上可获得680 mV以上的一阳暗含Voc。这比在同一阶段的单面激光掺杂电池获得的Voc高约50 mV。高Voc证明了这种结构具有实现超过20%的效率的潜力。

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