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Estimation of tungsten and ODS tungsten damages after dense plasma exposure in PF-12 and PF-1000

机译:PF-12和PF-1000中密集等离子体暴露后钨和ODS钨的破坏估算

摘要

The paper presents experimental investigations of damages in pure tungsten and ODS (oxide dispersed strengthened) tungsten under dense plasma shots. The experiments were performed with plasma focus devices PF-12 and PF-1000 with a power flux density of 10⁶…10¹² W/cm² using deuterium. The surface morphology of the targets exposed to plasma streams is analyzed using electron and optical microscopy. Due to the plasma effect, different surface structures, such as wave-like structures, a melted layer, a mesh of microcracks, droplets, craters, crevices and holes appear. Both the original and irradiated samples were investigated by local X-ray spectroscopic analysis and by X-ray phase-shift analysis.
机译:本文介绍了在密集的等离子体照射下纯钨和ODS(氧化物弥散强化)钨的损伤的实验研究。实验是使用氘离子等离子体聚焦装置PF-12和PF-1000,功率通量密度为10⁶…1010 W /cm²。使用电子和光学显微镜分析暴露于等离子体流的靶材的表面形态。由于等离子体效应,出现了不同的表面结构,例如波状结构,熔融层,微裂纹网,液滴,火山口,缝隙和孔。通过局部X射线光谱分析和X射线相移分析研究了原始样品和受辐照样品。

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