CVD Techniques for the Synthesis or Modification of Porous Ceramics

摘要

Chemical Vapor Deposition (CVD) has been recognized as an important production method for thin films. In CVD gaseous reactants are introduced into a reactor in which they react to form a solid on a surface. This technology is widely used in the processing of micro-electronic devices. The CVD process for the densification of a porous preform to make up a matrix material is referred to as Chemical Vapor Infiltration (CVI). In particle Precipitation aided CVD (PP-CVD) an aerosol is formed, and the particles are precipitated on a substrate by introducing an external force for particle deposition. This thesis deals with the high temperature chemistry of the formation of titanium nitride and titanium diboride in CVD, CVI, and PP-CVD. It gives a concise presentation of the experimental work on high temperature chemistry of these CVD techniques.