Optical Lithography: The Implications of the Electromagnetic-Field Theory

摘要

The optical projection lithography and the contact printing of a half-plane are treated, based on the electromagnetic diffraction theory. Integral representations are given for the time-average electric-energy density distribution of the projected edges which are illuminated by a linearly polarized monochromatic wave or by a quasi-monochromatic incoherent beam. The image space is either homogeneous or a perfectly conducting screen is inserted normal to the optical axis. The contact printing is treated in terms of the rigorous electromagnetic-field theory, by which the electro-magnetic-field distribution is derived in a stratified substrate, each layer of which may have an arbitrary refraction index.