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Flow-Field Measurement of Device-Induced Embedded Streamwise Vortex on a Flat Plate

机译:平板上器件诱导嵌入式流动涡流的流场测量

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Detailed flow-field measurements were performed downstream of a single vortex generator (VG) using an advanced Stereo Digital Particle Image Velocimetry system. Thc passive flow-control devices examined consisted of a low-profile VG with a device height, h, approximately equal to 20 percent of the boundary-layer thickness, sigma, and a conventional VG with h is approximately sigma. Flow-field data were taken at twelve cross-flow planes downstream of the VG to document and quantify the evolution of embedded streamwise vortex. The effects of device angle of attack on vortex development downstream were compared between the low-profile VG and the conventional VG. Key parameters including vorticity, circulation, trajectory, and half-life radius - describing concentration, strength, path, and size, respectively--of the device-induced streamwise vortex were extracted from the flow-field data. The magnitude of maximum vorticity increases as angle of attack increases for the low-profile VG, but the trend is reversed for the conventional VG, probably due to flow stalling around the larger device at higher angles of attack. Peak vorticity and circulation for the low-profile VG decays exponentially and inversely proportional to the distance downstream from the device. The device-height normalized vortex trajectories for the low-profile VG, especially in the lateral direction, follow the general trends of the conventional VG. The experimental database was used to validate the predictive capability of computational fluid dynamics (CFD). CFD accurately predicts the vortex circulation and path; however, improvements are needed for predicting the vorticity strength and vortex size.

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