Thermal and deformation analyses of a novel cryogenically cooled monochromator for an Advanced Photon Source beamline

摘要

The analytical results and design considerations for a novel cryogenically cooled Advanced Photon Source (APS) monochromator are presented. Because the monochromator uses silicon crystal, cryogenic cooling enables one to take advantage of the high conductivity and low thermal expansion coefficient of silicon at cryogenic temperatures. The APS monochromator features a machined slot with variable thickness below the surface. With this configuration, only a fraction of the total undulator power is absorbed by the crystal; the remaining power is transmitted through the crystal and is absorbed b a second element that can be cooled by standard cooling techniques. A variety of analyses has been performed with different parameters and configurations to maximize the performance of the monochromator and minimize the total absorbed power by the crystal.