Sheath impedance effects in very high frequency plasma experiments

摘要

The frequency dependence (13.56 MHz to 70 MHz) of the ion energy distribution at the ground electrode was measured by mass spectrometry in a symmetrical capacitive argon discharge. Reduced sheath impedance at Very High Frequency allows high levels of plasma power and substrate ion flux whilst maintaining low levels of ion energy and electrode voltage. The lower limit of ion bombardment energy is fixed by the sheath floating potential at high frequency, in contrast to low frequencies where only the rf voltage amplitude is determinant. The capacitive sheaths are thinner at high frequencies which accentuates the high frequency reduction in sheath impedance. It is argued that the frequency dependence of sheath impedance is responsible for the principal characteristics of Very High Frequency plasmas. The measurements are summarised by simple physical descriptions and compared with a Particle-In-Cell simulation. (author) figs., tabs., refs. (Atomindex citation 26:061650)