Electrolytic regeneration of acid cupric chloride printed circuit board etchant. Final report, August 1, 1995--October 31, 1996

摘要

The overall objective of this ERIP program was to make substantial progress in further developing a process for electrolytic regeneration of acid cupric chloride etchant. Specific objectives of the work were: (1) to define optimum system operating conditions by conducting a systematic study of process parameters, (2) to develop or find a superior electrolyic cell separator material, (3) to determine an optimum activation procedure for the flow-through carbon/graphite felt electrodes which are so critical to process performance, (4) to demonstrate - on the pre-prototype scale - electrolytic compensation for oxygen ingress - which causes etchant solution growth, and (5) to begin engineering design work on a prototype-scale regeneration unit. Parametric studies looked at the effect that key plating parameters have on copper deposit quality. Parameters tested included (a) velocity past the plating cathodes, (b) copper concentration in the catholyte solution from which the copper is being plated, (c) plating current density, and (d) catholyte cupric ion concentration. The most significant effects were obtained for velocity changes. The work showed that catholyte velocities above 0.5 ft/sec were needed to get adequate plating at 77.5 mA/sq cm and higher currents, and that even higher flow was better.