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Carbon implanted in optical grade fused silica: annealing effects in reducing and oxidizing atmospheres

机译:注入光学级熔融石英中的碳:退化对还原和氧化气氛的影响

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Carbon is implanted into fused silica with doses of 1, 3, 6, 10X10(sup 16) ions/cm(sup 2). Infrared spectroscopy identified the formation of CO and CO(sub 2) molecules in the implanted glasses. Relations among concentrations of carbon dioxide, carbon monoxide, and carbon doses are established by the infrared measurements. Annealing under different atmospheres have dramatic effects on CO and CO(sub 2) concentrations.

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