THE VAPOUR PHASE DEPOSITION OP BORON ON TITANIUM BY THE REACTION BETWEEN GASEOUS BORON TRICHLORIDE AND TITANIUM METAL

摘要

The inaction between boron trichloride vapour and titanium has been investigated in the temperature range 200 - 1350℃. It has been found that an initial reaction leads to the formation of titanium tetrachloride and the deposition of boron on titanium, but that except for reactions between 900 and 1000℃, the system is complicated by the formation of lower titanium chlorides due to secondary reactions between the titanium and titanium tetrachloride.