Development of Optical Thin Film Technology for Lasers and Synchrotron Radiation

摘要

Dielectric multilayer optical thin film devices play an important role not only in the working of lasers but also in different front line research activities using high power lasers and high intensity synchrotron radiation sources. Facilities are set up recently in the Spectroscopy Division to develop the optical thin film design and fabrication technologies indigeneously. Using the facilities thin film devices for different laser applications working in the wavelength range from 300 nm to 1064 nm were developed. Different technical aspects involved in the technology development are briefly described. 17 refs., 6 tables, 6 figures. (Atomindex citation 18:001626)