首页> 美国政府科技报告 >Advanced Light Source U8 beam line, 20--300 eV
【24h】

Advanced Light Source U8 beam line, 20--300 eV

机译:先进的光源U8光束线,20--300 eV

获取原文

摘要

The U8 is a beam line under construction at the Advanced Light Source (ALS). The beam line will be described along with calculations of its performance and its current status. An 8 cm period undulator is followed by two spherical collecting mirrors, an entrance slit, spherical gratings having a 15 degree deviation angle, a moveable exit slit, and refocusing and branching mirrors. Internal water cooling is provided to the metal M1 and M2 mirrors as well as to the gratings. Calculations have been made of both the flux output and the resolution over its photon energy range of 20--300 eV. The design goal was to achieve high intensity, 10(sup 12) photons/sec, at a high resolving power of 10,000. The U8 Participating Research Team (PRT) is planning experiments involving the photoelectron spectroscopy of gaseous atoms and molecules, the spectroscopy of ions and actinide spectroscopy.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号