Research in Pulsed Power Plasma Physics. Volume 2. Section Four

机译：脉冲功率等离子体物理研究。第2卷。第四节

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This report contains Volume 2, section 4 of Research in Pulsed Power PlasmaPhysics. Specific topics include: (1) Plasma source development, (2) Microsecond POS operation, (3) POS load coupling, and (4) The ZFX facility.

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Swanekemp, S.; Rose, D.;
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年度 1996
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总页数 658
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Plasma diagnostics; Plasma accelerators; Coupling(Interaction); Magnetic fields; Electron density; Pulsed lasers; Tables(Data); Plasma generators; Interferometers; Electrical loads; Magnetohydrodynamics; Anodes(Electron tubes); Electron accelerators; Coax;

机译：等离子体诊断;等离子体加速器;耦合（相互作用）;磁场;电子密度;脉冲激光;表（数据）;等离子体发生器;干涉仪;电气负载;磁流体动力学;阳极（电子管）;电子加速器;同轴电缆;

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Research in Pulsed Power Plasma Physics. Volume 2. Section Four

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