Chemically Advanced Nanolithography

摘要

Invented a new technique for patterning - microdisplacement printing - that solves the pattern dissolution issues inherent in microcontact printing. Worked out the kinetics and mechanism of displacement. Modeled displacement and showed that displacement kinetics follow a universal form. Commercialized molecules used for displacement. Developed a special resist stack that improves line edge roughness and produces highly optimized parent structures for molecular rulers. This was previously the limitation of the technique. Investigated failure modes both quantitatively and microscopically, targeting and analyzing failures by type and with intelligent design of test structures to elucidate the contributions and origins of different failure modes. Automated molecular ruler deposition, greatly enhancing the precision of the process. Demonstrated sacrificial layers and generations using molecular-ruler nanolithography. Used sacrificial layers to create daughter and parent structures of equal height. This can also be used to eliminate Au from the processing for compatibility with semiconductor processing. Created a method for ultrahigh resolution nanoimprint masters using molecular rulers on quartz. Demonstrated an all self-assembly method of molecular-ruler nanolithography by creating parents with shadow sphere nanolithography.