首页> 美国政府科技报告 >Resistance Relaxation Studies of Gas/Metal Reactions Leading to Simultaneous Dissolution and Gasification. The Dissociated Oxygen/Tantalum System above 2000K. Part 1. Methodology and the Role of Atomic Oxygen.
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Resistance Relaxation Studies of Gas/Metal Reactions Leading to Simultaneous Dissolution and Gasification. The Dissociated Oxygen/Tantalum System above 2000K. Part 1. Methodology and the Role of Atomic Oxygen.

机译:气体/金属反应的电阻弛豫研究导致同时溶解和气化。解离的氧/钽系统高于2000K。第1部分。方法论和原子氧的作用。

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By measuring the electrical resistance of tantalum filaments (1) during isothermal reaction with oxygen, (2) after isothermal degassing, and (3) after rapid temperature quench, we infer both the instantaneous dissolved oxygen concentration and the metal gasification rate. (Author)

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