首页> 美国政府科技报告 >p-n Junction PbS Sub 1-x Se Sub x Photodiodes Fabricated by Se(+) Ion Implantation.
【24h】

p-n Junction PbS Sub 1-x Se Sub x Photodiodes Fabricated by Se(+) Ion Implantation.

机译:通过se(+)离子注入制造的p-n结pbs sub 1-x se sub x光电二极管。

获取原文

摘要

PbS(1-x)Se(x) is a mixed IV-VI semiconductor which shows promise of being useful as a photodetector in the 3-5 micrometers region of the infrared spectrum at temperatures above 77 K. In this note, we report the use of Se(+) ion implantation to convert layers of n-type PbS(0.63)Se(0.37) into p-type material and present some results on photodiodes fabricated by this technique. (Author)

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号