A Study of Linear Very Near and Far Field Effects in Photoelastic Stress Intensity Determination,

摘要

A technique known as the Taylor Series Correction Method (TSCM) for extracting the stress intensity factor from photoelastic data is reviewed. The need for 'artificial'flaws is identified and an approach due to Savin is used to evaluate the near field effects of various practical flaw shapes upon the apparent stress intensity factor. Using the Sneddon-Srivastav solution for a line crack in a finite width plate,the constriction of the singular zone is demonstrated as the crack tip approaches the free edge. Results indicate that care must be taken in applying TSCM to obtain photoelastic data at appropriate distances from the crack tip. (Author)