Characterization of Crystallographic Structure and Internal Stress of Chromium Coatings Plated under Current Interruptions.

摘要

The effect of interrupted current (IC) plating on the visual crack morphology, crystallography, and residual stresses of electrodeposited chromium has been investigated. Varying the process parameters such as the on/off plating cycle and current density resulted in changing the crystallographic fiber texture of the deposit from the conventional orientation to a combination of , , and a small fraction of randomly oriented crystallites. Under these plating conditions, it was also found that (1) lower amounts of chromium hydride (CrHx) occur in the deposit, (2) a large decrease in the microcrack density of the deposit occurs, and (3) the deposits tend to become compressively stressed.