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A new single buffer layer for YBCO coated conductors prepared by chemical solution deposition

机译:通过化学溶液沉积制备用于YBCO涂层导体的新型单缓冲层

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A new single buffer layer YBiO3 has been proposed for YBCO coated conductors. Highly c-axis oriented YBiO3 buffer layer has been deposited on single crystal LaAIO(3) by a low-cost chemical solution deposition method in a temperature range as low as 730-800 degrees C in air. A very dense, smooth, pinhole-free morphology has been observed for YBiO3 buffer layer. Dense, homogeneous and epitaxialiy grown YBCO film has been obtained with its onset critical temperature 90 K and J(c) (77 K, 0 T) = 3.1 MA/cm(2). The addition of Bi2O3, Which melts at around 817 degrees C, has been argued to be responsible for the densification as well as low-process temperature of YBiO3 buffer layer. These results offer an alternative to prepare desirable buffer layer(s) for YBCO coated conductors via a cost-effective and easily scalable route. (c) 2007 Elsevier B.V. All rights reserved.
机译:已经提出了一种新的用于YBCO涂层导体的单缓冲层YBiO3。通过低成本化学溶液沉积方法,在空气中低至730-800摄氏度的温度范围内,已将高度c轴取向的YBiO3缓冲层沉积在单晶LaAIO(3)上。对于YBiO3缓冲层,观察到非常致密,光滑,无针孔的形态。已经获得了致密,均匀且外延生长的YBCO薄膜,其起始临界温度为90 K,J(c)(77 K,0 T)= 3.1 MA / cm(2)。据称,Bi2O3的熔融温度约为817摄氏度,这是造成YBiO3缓冲层致密化以及低工艺温度的原因。这些结果为通过成本有效且易于扩展的路线制备用于YBCO涂层导体的理想缓冲层提供了一种选择。 (c)2007 Elsevier B.V.保留所有权利。

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