机译:Al_(2)O_(3)原子层沉积的外延石墨烯表面制备
Global Strategies Group, North America, 2200 Defense Hwy., Suite 405, Crofton, Maryland 21114, USA;
U.S. Naval Research Laboratory, 4555 Overlook Ave., SW, Washington, DC 20375, USA;
机译:Evolution of crystallographic ordering in Hf_(1-x)Al_(x)O_(y) high-κ dielectric deposited by atomic layer deposition
机译:Al_(2)O_(3) prepared by atomic layer deposition as gate dielectric on 6H-SiC(0001)
机译:Transition Metal Dichalcogenide TiS2 Prepared by Hybrid Atomic Layer Deposition/Molecular Layer Deposition: Atomic-Level Insights with In Situ Synchrotron X-ray Studies and Molecular Surface Chemistry
机译:退火温度对通过柠檬酸盐合成的Re_3Fe_(4.5)Al_(4.5)Al_(0.5)Al_(0.5)O_(0.5)O_(12)(RE = Y,Gd)中的阳离子阳离子,结构和磁性的偏好的影响
机译:$ Al_ {2} O_ {3}:C $和$ Al_ {2} O_ {3} $晶体在同步加速器辐射激发下的发光比较研究