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机译:
Tokyo Inst Technol, Ceram Mat & Struct Lab, Midori Ku, 4259 Nagatsuta Cho, Yokohama, Kanagawa 2268503.;
rovidence.org;
Laser-induced fluorescence; Low-activation-energies; Glow-discharge; Elimination reactions; Silane; Plasma; Spectroscopy; Deposition; Radicals; Atoms;
机译:In situdetermination of optical constants of growing hydrogenated amorphous silicon film byphyphen;polarized light reflectance measurement on the surface
机译:Realhyphen;time detection of higher hydrides on the growing surface of hydrogenated amorphous silicon by infrared reflection absorption spectroscopy
机译:Argon sputtering analysis of the growing surface of hydrogenated amorphous silicon films
机译:AB-Initio Amorphous TiO_2结构和电学性质的计算
机译:Thermal-equilibrium defects in undoped hydrogenated amorphous silicon, silicon-carbon, and silicon-nitrogen