Coupling of a vacuum-ultraviolet-radiation source to a processing system - art. no. 043306

摘要

A hollow capillary array is examined as a coupling window between an electron cyclotron resonance plasma vacuum ultraviolet (vuv) source and a separate processing chamber. The transmission of vuv through the capillary array as a function of wavelength is measured and shown to agree with theoretical calculations. A silicon wafer with a dielectric surface is then placed in the processing chamber and exposed to vuv, both with and without the capillary array. A Kelvin probe is used to measure the surface charge induced on the wafer by photoemission in both cases, which confirms the previously measured transmission values. The results show that a capillary array can efficiently couple vuv radiation from a source to a processing chamber without significant modification in the spectrum and its resulting effects on a material. (c) 2006 American Institute of Physics.