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首页> 外文期刊>Journal of Applied Physics >Response to 'Comment on 'Numerical study of electrical transport in inhomogeneous Schottky diodes'' J. Appl. Phys. 88, 7366 (2000)
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Response to 'Comment on 'Numerical study of electrical transport in inhomogeneous Schottky diodes'' J. Appl. Phys. 88, 7366 (2000)

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摘要

In his comment J. Appl. Phys. 88. 7366 (2000) Tung brings into question the appropriateness of some of the simulation conditions used in J. Appl. Phys. 85, 1935 (1999) and the conclusion taken from the results. This Response explains that the differences in the conclusions between our work and the work of Sullivan et al. J. Appl. Phys. 70, 7403 (1991) are caused by the differences in the parameters of the inhomogeneous structures described. It is also shown that the numerical experiments made by Sullivan et al. J. Appl. Phys. 70, 7403 (1991) were done for special diode parameters, and they probably did not support such general conclusions as were made.

著录项

  • 来源
    《Journal of Applied Physics 》 |2000年第12期| 7368-7369| 共2页
  • 作者

    J. Osvald;

  • 作者单位

    Institute of Electrical Engineering, Slovak Academy of Sciences, Dubravska cesta 9, 842 39 Bratislava, Slovakia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 应用物理学 ;
  • 关键词

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