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首页> 外文期刊>Journal of Applied Physics >Anomalous Hall effects in Co_(2)FeSi Heusler compound films and Co_(2)FeSi-Al_(2)O_(3) granular films
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Anomalous Hall effects in Co_(2)FeSi Heusler compound films and Co_(2)FeSi-Al_(2)O_(3) granular films

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摘要

We fabricated three Co_(2)FeSi Heusler compound films at different temperatures (room temperature, 673, and 873 K) by rf sputtering deposition method and a series of (Co_(2)FeSi)_(x)(Al_(2)O_(3))_(1-x) (0.4 approx.< x <= 1) granular films at room temperature by co-sputtering method. The structures as well as the temperature behaviors of anomalous Hall resistivities, low-field Hall sensitivities, and longitudinal resistivities of those films were investigated experimentally. We found that the Co_(2)FeSi Heusler compound film deposited at room temperature is poorly crystallized, the film deposited at 673 K is crystallized in the disordered A2 type structure, and L2_(1) and B2 structures are present in the film deposited at 873 K. For the Co_(2)FeSi films deposited at 673 and 873 K, the saturated anomalous Hall resistivity (rho)_(A)~(s) scales with the longitudinal resistivity (rho)_(xx) as (rho)_(A)~(s) propor. to (rho)_(xx)~(n), with n much larger than 2. There is no scaling relation between (rho)_(A)~(s) and (rho)_(xx) for the (Co_(2)FeSi)_(x)(Al_(2)O_(3))_(1-x) (0.58 <= x <= 1, x velence 1 represents the Co_(2)FeSi film deposited at room temperature) granular films. For the granular films, as x decreases from 1 to 0.67, the magnitude of (rho)_(xx) increases by a factor of approx25, whereas the magnitude enhancement in (rho)_(A)~(s) is less than 50percent, which strongly suggests that the longitudinal and anomalous Hall transports in ferromagnetic granular films are governed by different mechanisms. The low-field Hall sensitivities of (Co_(2)FeSi)_(x)(Al_(2)O_(3))_(1-x) films with x values of 0.6 and 0.65 are large and temperature insensitivity from 300 down to approx75 K, which might make them be good candidate materials for low-field Hall sensors.

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  • 来源
    《Journal of Applied Physics 》 |2012年第8期| 083919-1-083919-7| 共7页
  • 作者单位

    Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Faculty of Science, Tianjin University, Tianjin 300072, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 应用物理学 ;
  • 关键词

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