...
首页> 外文期刊>Journal of Applied Physics >Plasma modeling for a nonsymmetric capacitive discharge driven by a nonsinusoidal radio frequency current
【24h】

Plasma modeling for a nonsymmetric capacitive discharge driven by a nonsinusoidal radio frequency current

机译:

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

An analytical solution for the sheath dynamics of an asymmetrically driven capacitively coupled plasma is obtained under the assumptions of time-independent, collisionless ion motion, inertialess electrons, and uniform current density. Modeling is performed considering that the plasma is driven by a nonsinusoidal radio frequency (rf) current which can be resolved into a finite number of harmonic components. Together with different sheath parameters the equation for the bulk plasma impedance is also obtained to calculate the overall plasma impedance and the overall rf voltage. Assuming equal plate areas the solution for a symmetric discharge is also obtainable from this model. We have found that the even harmonic components of rf voltage and impedance are always present, even in a symmetric discharge. Experimental results are shown to be in qualitative agreement with the theoretical model. The values of normalized rf voltage and impedance harmonics assume lower values as the asymmetry of the plasma chamber decreases.

著录项

  • 来源
    《Journal of Applied Physics》 |2002年第9期|5604-5613|共10页
  • 作者单位

    Microelectronics Research Laboratory, Research Institute for Networks and Communications Engineering (RINCE), School of Electronic Engineering, Dublin City University, Dublin 9, Ireland;

    rovidence.org;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 应用物理学;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号