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Arrhenius-like behavior in plasma reactions

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摘要

An Arrhenius-like behavior of the silane dissociation rate constant as a function of the power actually fed in a rf discharge system is reported. The rate constant is calculated using mass-spectrometric measurements of silane consumption for 50 and 75 mTorr discharges, while the power consumed in the discharge is determined by using detailed voltage and current measurements. The slope of the natural logarithm of the dissociation rate constant as a function of the inverse of the discharge power increases with pressure. This is attributed to a change in the shape and/or the mean energy of the electron energy distribution function, while the linearity indicates an analogous increase of the active electron concentration with increasing discharge power, excluding a significant change in the shape of the electron energy distribution function. # 1997 American Institute of Physics. S0003-6951 (97104731-1

著录项

  • 来源
    《Applied physics letters》 |1997年第8期|605-607|共3页
  • 作者单位

    Department of Chemical Engineering, Laboratory of Plasma Chemistry, University of Patras,/ 26500 Patras, Greece;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 应用物理学;
  • 关键词

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