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Fabrication of A1N Coatings by Reactive Atmospheric Plasma Spray Nitriding of Al Powders

机译:铝粉反应性大气等离子喷涂氮化制备AlN涂层

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摘要

Atmospheric Plasma Spray (APS) is well-established process and is widely used to produce various coatings with high deposition rate for structural and functional applications. Aluminum nitride is a promising material due to its outstanding properties. In this study, A1N coatings were synthesized by APS process through reactive plasma nitriding of Al powders by nitrogen plasma. Al powders were supplied into the plasma stream by Ar carrier gas and reacted with the surrounding plasma, then were deposited onto substrate. The obtained coatings were cubic-AlN/Al mixture with 100 pm of thickness at 150 mm of spray distance. Since the nitride content increases gradually with spray distance, the coating almost consists of A1N at 300 mm. However, the thickness of the coatings decreased with increasing spray distance, it was less than 10 μm at 300 mm spray distance. The nitriding reaction was investigated and it indicated that Al particles may react during flight and after deposition on the substrate surface. Completing the nitriding during flight (formation of A1N in-flight) decreases the coatings thickness. We can conclude that enhancing the nitriding reaction after deposition at short spray distance may enable to fabricate thick A1N based coatings.
机译:大气等离子喷涂(APS)是一种成熟的工艺,广泛用于生产各种具有高沉积速率的涂料,用于结构和功能应用。氮化铝由于其出色的性能而成为有前途的材料。在这项研究中,A1N涂层是通过APS工艺通过氮等离子体对铝粉进行反应性等离子体氮化而合成的。通过Ar载气将Al粉供应到等离子体流中,并与周围的等离子体反应,然后将其沉积到基板上。所获得的涂层是立方AlN / Al混合物,在150 mm的喷涂距离下厚度为100 pm。由于氮化物含量随喷涂距离的增加而逐渐增加,因此涂层几乎由300 mm的AlN组成。但是,涂层厚度随喷涂距离的增加而减小,在300 mm喷涂距离下,涂层厚度小于10μm。研究了氮化反应,结果表明Al粒子可能在飞行过程中以及沉积在基材表面后发生反应。在飞行过程中完成氮化(飞行中形成AlN)会减小涂层的厚度。我们可以得出结论,在较短的喷涂距离下沉积后增强氮化反应可以制造出厚厚的基于AlN的涂层。

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