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Specific contact resistance for alloyed Au‐Zn contacts onp‐type GaxIn1−xPyAs1−y

机译:合金Au‐Zn触点的比接触电阻p连字符;GaxIn1−xPyAs1−y型

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摘要

The specific contact resistance for a pulse plated and alloyed Au‐Zn (16 at.  Zn) contact onp‐type Ga0.28In0.72P0.39As0.61was found to be 3.60.4×10−5OHgr; cm2. Results of Rutherford backscattering measurements with 1.8‐MeV4He+showed that the alloyed Au moved only ∼1500 A˚ into the quaternary layer, while In and GaAs were displaced to the surface.
机译:脉冲镀合金Au‐Zn(16 at. % Zn)接触的比接触电阻为3.60.4×0.72P0.39As0.61。卢瑟福用1.8&连字符;MeV4He+进行的反向散射测量结果表明,合金Au仅向四元层移动了∼1500 A&环,而In和GaAs则被置换到表面。

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